Product Introduction

Niobium targets play a key role in the reactive sputter deposition of niobium pentoxide (Nb₂O₅) films. Impurities in the sputtering target can directly impact the optical properties of the Nb₂O₅ film. To address this, high – purity sputtering – grade niobium is specially provided for applications requiring precise control over film quality, ensuring optimal performance in optical and related advanced manufacturing processes.

Core Advantages

Chemical Purity Specifications(ppm)

Impurities (ppm)Sputtering Grade NiobiumCommercial Grade Niobium
Fe<20<100
Ni<25<50
Cr<5<10
Cu<5<10
Zr<50<200
P<30<30
Si<30<50
Ta<400<3000
W<50<500
Mo<50<800
Na<3<10
Li<5<10
K<3<10
U<0.1<10
Th<0.1<10
Others<10<10
C<40<100
O<150<200
N<100<100
H<15<15

Application Scenarios

Quality Assurance

Rigorous quality control measures are implemented to ensure that both sputtering grade and commercial grade niobium meet their respective purity standards. This ensures consistent performance in various applications, providing a reliable material solution for industries relying on niobium sputtering processes.

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