Product Positioning
Specialized for sputtering applications, this tantalum material ensures high – purity and precise impurity control. It meets the strict requirements of industries like electronics and semiconductors for thin – film deposition processes, enabling the production of high – performance tantalum films.
Core Advantages
- Purity Grades: Available in 5N Ta (99.999% pure), 4N5 Ta (99.995% pure), 4N Ta (99.99% pure), and 3N5 Ta (99.95% pure).
- Strict Impurity Control: Minimizes the impact of impurities on sputtering film quality, ensuring uniform film formation and excellent performance.
Technical Specifications（ppm）
| Impurities | 5N Ta | 4N5 Ta | 4N Ta | 3N5 Ta |
| Fe | <1 | <1 | <1 | <5 |
| Ni | <1 | <1 | <1 | <5 |
| Cr | <1 | <1 | <1 | <5 |
| Cu | <1 | <1 | <1 | <5 |
| Nb | <10 | <50 | <100 | <500 |
| W | <8 | <25 | <80 | <150 |
| Mo | <5 | <25 | <50 | <100 |
| Na | <0.4 | <0.4 | <1 | <5 |
| Li | <0.1 | <0.1 | <1 | <5 |
| K | <0.4 | <0.4 | <1 | <5 |
| U | <0.001 | <0.005 | <0.005 | <0.005 |
| Th | <0.001 | <0.005 | <0.005 | <0.005 |
| Others | <0.1 | <1 | <5 | <10 |
| C | <30 | <40 | <40 | <50 |
| O | <80 | <80 | <100 | <100 |
| N | <30 | <40 | <40 | <50 |
| H | <5 | <10 | <10 | <10 |
Application Scenarios
- Electronics Industry: Used for manufacturing tantalum thin films in integrated circuits, ensuring stable electrical performance.
- Semiconductor Field: Applied in sputtering processes for semiconductor device fabrication, contributing to high – precision chip production.
- Optical Coating: Helps in creating high – quality optical coatings with good uniformity and adhesion.
Quality Assurance
Adheres to strict quality control procedures. The impurity content is accurately measured and controlled to meet the high standards of sputtering applications, providing reliable material support for advanced manufacturing processes.