Hafnium foil and strip, ASTM B776, high-purity for nuclear and semiconductor applications

Hafnium Foil-Strip

Key Advantages

High purity for critical service: Hf + Zr > 99.98%, Zr < 1% for reliable neutron absorption and high-purity thin film processes.
Precision control: Thickness 0.01–0.5 mm, tolerance ±0.01 mm, burr-free and oil-free for precision assemblies and cleanroom use.
Flexible formats: Coiled foil for continuous production or cut-to-length strip for custom builds; aligned with semiconductor, nuclear and aerospace workflows.
Global compliance: Produced to ASTM B776, ISO 7233 and compatible with ASTM/ASME/MIL frameworks for straightforward qualification.

Primary Applications

Nuclear energy: Control rods, neutron absorbers and shielding elements.
Aerospace: Components exposed to high temperatures (up to ~2233°C) in engines and nozzles.
Semiconductor: Base material for HfO₂ thin films and high-k dielectric layers.

Testing (Typical)

Chemical composition analysis (Hf/Zr ratio & impurities)
Dimensional and thickness tolerance checks
Surface inspection (burr-free, oil-free, defect control)

Send your specifications (grade, size, quantity) — quotation and lead time within 12 hours. Trial orders with flexible MOQ are supported for evaluation and qualification. All materials are supplied with EN 10204 3.1 MTC and full inspection documentation for export compliance.

Product Description

LuminaTitanium delivers high-performance hafnium foil and strip for nuclear, aerospace and semiconductor applications. Manufactured by cold rolling and annealing to ASTM B776 / ISO 7233, our hafnium foil offers tightly controlled thickness, ultra-low zirconium content and clean, burr-free surfaces to support critical neutron absorption and advanced thin-film processes.

Technical Specifications

Parameter	Details	Why It Works for You
Processing	Cold rolled, annealed	Stable thickness, ductility and formability for precision parts
Standards	ASTM B776, ISO 7233	Globally recognized; simplifies technical approval
Thickness	0.01–0.5 mm (±0.01 mm)	Covers ultra-thin semiconductor use to structural foil
Purity	Hf + Zr > 99.98%, Zr < 1%	Ensures nuclear-grade neutron absorption & high-purity deposition
Surface finish	Burr-free, oil-free, annealed	Reduces contamination and improves bonding/coating
Form	Coiled foil, cut-to-length strip	Fits continuous lines or custom assemblies

Ordering Checklist

Standard & purity: ASTM B776 / ISO 7233; required Hf/Zr ratio.
Dimensions: thickness (0.01–0.5 mm), width, and length or coil specs; tolerance targets.
Surface & cleanliness: burr-free, oil-free; any special cleaning or packing for cleanroom use.
Testing & documentation: chemical & dimensional reports; ISO 9001-based QC; extra certifications if needed.
Quantity & packaging: coil/strip configuration; wooden/plywood/custom cases.
End use: nuclear, aerospace, semiconductor, R&D, etc., to align specs and documentation.